Laser ablation of accelerometer proof mass

ABSTRACT

A system for producing a proof-mass assembly includes a translation stage to receive a flapper hingedly supported by a bifilar flexure that extends radially inwardly from a support ring, wherein the bifilar flexure comprises a pair of flexure arms spaced apart by an opening or window; and a femtosecond laser optically coupled to the translation stage with focusing optics, the femtosecond laser applying a laser beam on the flexure arms over a plurality of passes to gradually thin the bifilar flexure regions, the laser periodically reducing a laser output to minimize damage from laser scanning and maximize bifilar flexure strength until the bifilar flexure reaches a predetermined thickness.

This application is related to Application entitled “ACCELEROMETER WITHBUILT-IN TEMPERATURE CORRECTION FACTORS” with Ser. No. ______, filedconcurrently herewith, the content of which isincorporated-by-reference.

BACKGROUND

The present invention relates to laser trimming of an accelerometerproof mass.

An accelerometer of the type described herein typically employs a dampedproof mass (also known as seismic mass) supported by one or more hinges.Under the influence of external accelerations the proof mass deflectsfrom its neutral position. This deflection is measured and nulled byapplication of an electromagnetic force feedback. The acceleration iscalculated from the measured value of force feedback required to nullthe proof mass deflection.

Amorphous quartz is commonly used to fabricate the accelerometer proofmass. Quartz has two qualities that make it particularly attractive forproof mass use; 1) It has a very small coefficient of thermal expansionand; 2) it is brittle or in other terms its ductility is very low. Thefirst of these properties results in high stability over a largetemperature range (e.g. −40 C to +150 C). The second of these propertiesresults in excellent shock performance. The proof mass and supporthinges are not deformed by high shock.

The quartz proof mass is conventionally fabricated using wet-etchtechniques. Hydrofluoric (HF) acid is typically used as an etchant whichattacks quartz at a high etch rate. Essentially the proof mass is coatedwith a photoresist that is exposed in areas where the proof mass is tobe etched. The etch solution is generally a buffered and diluted HF acidsolution. The proof mass is immersed in the acid solution for a specifictime to enable thinning down of the proof mass support hinges. Generallythe etch process reduces the hinge thickness from 0.030 inch to about0.001 inch. However, stopping the etch process at the optimum hingethickness can be difficult because of the minor variations in the etchrate (typically 0.005″/hour at an etch solution temperature of 70° C.).

SUMMARY

A system for producing a proof-mass assembly includes a translationstage to receive a flapper hingedly supported by a bifilar flexure thatextends radially inwardly from a support ring, wherein the bifilarflexure comprises a pair of flexure arms spaced apart by an opening orwindow; and a femtosecond laser optically coupled to the translationstage with focusing optics, the femtosecond laser applying a laser beamon the flexure arms over a plurality of passes to gradually thin thebifilar flexure regions, the laser periodically reducing a laser outputto minimize damage from laser scanning and maximize bifilar flexurestrength until the bifilar flexure reaches a predetermined thickness.

Advantages of the preferred embodiment may include one or more of thefollowing. The present system improves the process of thinning the proofmass hinges by eliminating entirely the etch process and substitutinginstead a laser ablation fabrication process. The laser fabricationprocess is highly controllable and reproducible as compared to the wetetch process. Many variables in the wet etch process including, forinstance temperature, etch solution concentration, etch solutioncontamination, among others, make it difficult to produce the sameresults time after time. By contrast the laser fabrication processvariables (laser power and raster pattern) are precisely controllableand hence the results of using the laser ablation fabrication processare highly reproducible.

As is well known there are several laser systems available commerciallyto ablate surfaces. The femtolaser is unique among these laser systemsin that the pulse width is very short (e.g. typically <500femtoseconds). The advantage of using a very short pulse to ablatematerial is that this enables very thin surfaces (e.g. the hingessupporting the accelerometer proof mass) to be ablated with minimaldamage to the under surface or surrounding area of the ablate site.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows an exemplary laser-based proof mass fabrication system.

FIG. 2A shows a top view of an exemplary a proof mass formed using thesystem of FIG. 1 and the process shown in FIG. 3.

FIG. 2B shows a side view, while FIG. 2C shows a perspective view of theproof mass of FIG. 2A.

FIG. 3 shows an exemplary process for fabricating the proof mass ofFIGS. 2A-2C.

FIG. 4A shows an exploded view of an accelerometer using the proof massof FIG. 2C, while FIG. 4B shows the assembled accelerometer.

DESCRIPTION

A diagram showing the laser-based proof mass fabrication system is shownin FIG. 1. A femtosecond laser 100 produces light pulses at a frequencyof 1040 nm (infrared light). This pulse can be used directly to ablatesurfaces by using light path 120. The light output of the laser also isused to drive a frequency doubling or second harmonic generation (SHG)module 102.

The SHG module produces light with a wavelength of 520 nm (green light).The green light can be used to ablate material by using light path 110.The ability of being able to use either green or infrared light is thatthe absorption coefficient for quartz is slightly different for thesetwo frequencies. The operation of the SHG module is controlled by thefemptolaser software operating system and can be turned on or offdepending on the frequency desired for the ablation process.

The femtosecond laser is advantageous in that the duration of the pulsedoutput is very short on the order of 400 nanoseconds. This short pulsewidth enables the ablation and removal of material at the laser focalspot without significant damage to surrounding material around or underthe laser focal point. The femtosecond laser pulse width is much shorterthat the pulse width of comparable laser technologies (e.g. excimerlaser and neodymium:YAG laser) and this fact makes this laser technologyhighly suitable for the fabrication of the hinges of the accelerometerproof mass. The laser spot size is also an important parameter in theablation process. Typical spot sizes of 5 microns can be achieved withthe femptolaser and focusing optics. This enables concentration of thelaser energy in a very small localized area contributing to theminimization of laser damage to surrounding areas.

Rastering of the laser is accomplished by using a galvanometer or galvosystem 160 consisting of rotating mirrors. The output of the femptolaser100 is provided to flip-mounted mirrors 104 to create a green path 110.In one embodiment, the light beam is sent through quarter wavelengthplate 106 and then to a beam expander 108. The quarter wavelength plateconvert the linearly polarized light from the femptolaser 100 tocircularly polarized light which is more suitable for the ablationprocess. The beam expanders are required to reduce the power per squarearea of the beam so as to not damage the focusing lens. The expandedgreen beam is reflected from flip-mounted mirrors 114, 134 and 136before entering the focusing optics 140.

Turning now to the infrared path 120, the femptolaser light beam isreflected by mirrors 104 and 124 to quarter wavelength plate 126 andthen to a beam expander 132. The laser beam from expander 132 is sent tothe flip-mounted mirror 134 which directs the beam to the focusingoptics via mirror 136. The focusing optics reduces the beam diameter atthe ablation site on the proof mass to about 5 microns. The proof mass142 is located on an X-Y-Z translation stage, which can move the proofmass 142 to a position suitable for the ablation process to occur.

An important characteristic of a laser fabrication process in contrastto a wet etch process is that the laser process is highly controllableand reproducible as compared to a wet etch process. Many variables inthe wet etch process including, for instance temperature, etch solutionconcentration, etch solution contamination, among others, make itdifficult to produce the same results time after time. By contrast thelaser fabrication process variables (laser power, raster pattern) areprecisely controllable and hence the results of using this fabricationprocess are highly reproducible.

FIG. 2A shows a top view of an exemplary a proof mass 200 formed usingthe system of FIG. 1 and the process shown in FIG. 3. FIG. 2B shows aside view, while FIG. 2C shows a perspective view of the proof mass ofFIG. 2A. Turning now to FIG. 2, the proof-mass assembly 200 comprises aflapper or reed 210 hingedly supported by flexures 231 and 232 thatextend radially inwardly from a support ring 240. The flapper 210 is ofcircular configuration except for parts adjacent the hinges 231 and 232and is separated from the circular support ring 140 by a narrow annularor arcuate gap 212. The flapper 210 is of the same thickness as the mainbody of the ring 240 but approximately 0.002 inch thinner than the toparcurate section of the support ring 241 The proof mass supportstructure comprises a pair of flexure arms 231 and 232 spaced apart byan opening or window 234 with curvaceous corners, the arms being onopposite sides of the axis Z-Z of symmetry. By employing a multiple armflexure, twisting of the flapper about the axis Z-Z of the flexure andother warpage that might occur in the flexure is reduced.

An arcuate electrode on the upper surface of proof mass 210 is createdby metalizing this surface. Similarly, an arcuate electrode on the lowersurface of proof mass is created by metalizing this surface. Theseelectrodes act as one half of two capacitor plates. The other two onehalf capacitor plates are formed by an upper and lower pole piecedescribed later with respect to FIG. 4. The proof mass and pole piecesare clamped together in such a manner that the two capacitors have equalvalues of capacitance when the flapper is in its neutral position. Inaddition, the proof mass and pole pieces are clamped together by twoscrews threading holes 242 and 243 such that only the top part 241 ofarcurate support ring 240 is in contact with upper and lower polepieces. This clamping design produces an approximate 0.001″ gap betweenthe proof mass top and bottom electrodes and the corresponding top andbottom pole pieces. Such a gap produces two matched capacitors withvalues of about 30 pF.

FIG. 3 shows an exemplary process for fabricating the proof mass ofFIGS. 2A-2C. The basic fabrication of this takes part in three stages asfollows:

-   -   1. Starting with a cylindrical quartz wafer of 0.030″ thickness        the general shape of the PM is fabricated using a laser such as        a CO2 laser (310)    -   2. The hinge areas 231-232 shown in FIG. 2 are then thinned from        0.030″ thickness to approximately 0.001″ thickness. This is done        by scanning the femtosecond laser on the flexure arms 231-232        over a plurality of passes to gradually thin the hinge regions        231-232 (312). Additionally, periodically, the proof mass is        flipped so that the opposite sides of the hinge regions 231-232        are trimmed (314). The laser pulsed beam (pulsing occurs        typically at 500,000 pulses/sec) is scanned over the hinge area        in multiple passes to gradually thin the hinge region. By        turning the proof mass by 180° the thinning process is achieved        from both sides of the hinge equally. To build a robust hinge        the areas where the hinge connects to thicker parts of the PM,        are feathered to produces a gradual transition from a thick to a        thin section.    -   In order to minimize the damage to the hinge volume, the laser        power used to ablate the hinge material is reduced as the hinge        approaches its final thickness (316). Reducing the laser power        in this manner further reduces damage to the volume under the        laser focal point and insures that the hinge at its final        thickness of 0.001″ is as strong as the amorphous quartz wafer        from which it was formed.    -   This thinning is conventionally achieved by a photo etch process        using a diluted hydrofluoric acid. In the case of the present        invention this thinning is done with a femtosecond laser        operating at 520 nm or 1040 nm wavelength. This laser produces a        very short light pulse (about 400 femptoseconds long). Because        the light pulse is very short the laser pulse removes material        from the hinge area in an ablation process that minimizes the        damage to the surrounding area or underlying substrate.    -   3. After thinning the hinge areas, a final thinning of the PM is        accomplished by laser ablation to all of the PM areas shown in        FIG. 2 but excluding the hinge areas and the cross hatched area        241 at the top of the PM (320). This final ablation enables the        PM to be clamped between two pole pieces such that the only        contact between the pole pieces and the PM is the cross hatched        area 241 shown in FIG. 2.

FIG. 4A shows an exemplary quartz proof mass 1 with two support hinges6. In one embodiment, the support hinges 6 are laser trimmed, asdescribed above. The proof mass 1 is positioned between first and secondpole pieces 2 and 3. In one embodiment, the first pole piece 2 isfabricated from Invar which has a thermal expansion coefficient thatclosely matches amorphous quartz.

The bottom pole piece 2 has a magnet 7 mounted inside it which producesa magnetic field that cuts the feedback coil 3. When the feedback coilis energized with a current a force is applied to the coil and proofmass in such a way as to move the proof mass up and down on its hinges.This force is used to counter any movement of the proof mass due toaccelerations or the pull of gravity. In such a manner of operation theproof mass is always maintained in a balanced or neutral position andthe value of the current required to keep the proof mass centered (withequal upper and lower capacitances) is used as a measure ofacceleration. The generic name for such a design is Torqeu BalanceAccelerometer (TBA). The TBA electronics 8 is also shown in FIG. 4A.Various modifications to the implementations described in thisdisclosure may be readily apparent to those skilled in the art, and thegeneric principles defined herein may be applied to otherimplementations without departing from the spirit or scope of thisdisclosure. Thus, the claims are not intended to be limited to theimplementations shown herein, but are to be accorded the widest scopeconsistent with this disclosure, the principles and the novel featuresdisclosed herein. The word “exemplary” is used exclusively herein tomean “serving as an example, instance, or illustration.” Anyimplementation described herein as “exemplary” is not necessarily to beconstrued as preferred or advantageous over other implementations.Additionally, a person having ordinary skill in the art will readilyappreciate, the terms “upper” and “lower” are sometimes used for ease ofdescribing the figures, and indicate relative positions corresponding tothe orientation of the figure on a properly oriented page, and may notreflect the proper orientation of the IMOD as implemented.

Certain features that are described in this specification in the contextof separate implementations also can be implemented in combination in asingle implementation. Conversely, various features that are describedin the context of a single implementation also can be implemented inmultiple implementations separately or in any suitable sub combination.Moreover, although features may be described above as acting in certaincombinations and even initially claimed as such, one or more featuresfrom a claimed combination can in some cases be excised from thecombination, and the claimed combination may be directed to asub-combination or variation of a sub-combination.

Similarly, while operations are depicted in the drawings in a particularorder, this should not be understood as requiring that such operationsbe performed in the particular order shown or in sequential order, orthat all illustrated operations be performed, to achieve desirableresults. Further, the drawings may schematically depict one more exampleprocesses in the form of a flow diagram. However, other operations thatare not depicted can be incorporated in the example processes that areschematically illustrated. For example, one or more additionaloperations can be performed before, after, simultaneously, or betweenany of the illustrated operations. In certain circumstances,multitasking and parallel processing may be advantageous. Moreover, theseparation of various system components in the implementations describedabove should not be understood as requiring such separation in allimplementations, and it should be understood that the described programcomponents and systems can generally be integrated together in a singlesoftware product or packaged into multiple software products.Additionally, other implementations are within the scope of thefollowing claims. In some cases, the actions recited in the claims canbe performed in a different order and still achieve desirable results.

The various illustrative logics, logical blocks, modules, circuits andalgorithm steps described in connection with the implementationsdisclosed herein may be implemented as electronic hardware, computersoftware, or combinations of both. The interchangeability of hardwareand software has been described generally, in terms of functionality,and illustrated in the various illustrative components, blocks, modules,circuits and steps described above. Whether such functionality isimplemented in hardware or software depends upon the particularapplication and design constraints imposed on the overall system.

The hardware and data processing apparatus used to implement the variousillustrative logics, logical blocks, modules and circuits described inconnection with the aspects disclosed herein may be implemented orperformed with a general purpose single- or multi-chip processor, adigital signal processor (DSP), an application specific integratedcircuit (ASIC), a field programmable gate array (FPGA) or otherprogrammable logic device, discrete gate or transistor logic, discretehardware components, or any combination thereof designed to perform thefunctions described herein. A general purpose processor may be amicroprocessor, or, any conventional processor, controller,microcontroller, or state machine. A processor may also be implementedas a combination of computing devices, e.g., a combination of a DSP anda microprocessor, a plurality of microprocessors, one or moremicroprocessors in conjunction with a DSP core, or any other suchconfiguration. In some implementations, particular steps and methods maybe performed by circuitry that is specific to a given function.

It will be understood that the flapper of this invention may be employedin other ways, and that the flapper and the accelerometer may beconstructed in other ways. In particular, it will also be understoodthat the various parts of the flapper may be arranged in otherconfigurations and may be employed in other types of accelerometers suchas accelerometers in which the stator members are non-magnetic. It istherefore to be understood that the invention is not limited to thespecific device described but may be embodied in many other forms andmay be employed in many other ways within the scope of the appendedclaims.

Other types of materials may be employed in the construction of anaccelerometer in accordance with this invention. Likewise, differentconfigurations of the elements and positioning of the posts may beemployed. It is, therefore, to be understood that the invention is notlimited to the specific device disclosed but may be embodied in manyother forms within the scope of the appended claims.

What is claimed is:
 1. A method for producing a proof-mass assembly,comprising: forming a flapper hingedly supported by a bifilar flexurethat extends radially inwardly from a support ring, wherein the bifilarflexure comprises a pair of flexure arms spaced apart by an opening orwindow; scanning a femtosecond laser on the flexure arms over aplurality of passes to gradually thin the bifilar flexure regions; andperiodically reducing femtosecond laser output to minimize damage fromlaser scanning and maximize bifilar flexure strength until the bifilarflexure reaches a predetermined thickness.
 2. The method of claim 1,comprising ablating the other side of the flexure arms.
 3. The method ofclaim 2, comprising: scanning a femtosecond laser on the flexure armsover a plurality of passes to gradually thin the bifilar flexureregions; periodically reducing femtosecond laser output until thebifilar flexure reaches a predetermined thickness to minimize damagefrom laser scanning and maximize the bifilar flexure strength.
 4. Themethod of claim 1, comprising feathering with the femtosecond laser inareas where the flexure arms connect to the flapper or reed andproducing a gradual transition from a thick to a thin section.
 5. Themethod of claim 1, comprising, after ablating the bifilar flexure,performing laser ablation to all of the proof mass areas excluding theflexure arm areas and a predetermined area on top of the proof mass toenable the proof mass to be clamped between two pole pieces and the onlycontact between the pole pieces and the proof mass occurs at thepredetermined area.
 6. The method of claim 1, wherein the flappercomprises a circular configuration except for parts adjacent the bifilarflexure and is spaced from the circular support ring by an annular orarcuate gap.
 7. The method of claim 1, comprising wherein the opening orwindow comprises curvaceous corners.
 8. The method of claim 1, whereinthe flapper is of the same thickness as the support ring except at thetop arcuate area of the support ring.
 9. The method of claim 1, whereinthe proof-mass assembly is formed from a quartz wafer.
 10. The method ofclaim 1, comprising providing an arcuate electrode on an upper surfaceof the flapper opposite a first pole piece and providing an arcuateelectrode on a lower surface of the flapper opposite a second polepiece.
 11. The method of claim 10, wherein the electrodes form capacitorplates and wherein the two capacitors have equal capacitance when theflapper is in a neutral position.
 12. A system for producing aproof-mass assembly, comprising: a translation stage to receive aflapper hingedly supported by a bifilar flexure with a pair of flexurearms spaced apart by an opening or window, the bifilar flexure extendingradially inwardly from a support ring; and a femtosecond laser opticallycoupled to the translation stage with focusing optics, the femtosecondlaser applying a laser beam on the flexure arms over a plurality ofpasses until the bifilar flexure reaches a predetermined thickness, thelaser periodically reducing a laser output to minimize damage from laserscanning and maximize bifilar flexure strength.
 13. The system of claim12, comprising a robot module to flip the flapper for the femtosecondlaser to ablate the other side of the flexure arms.
 14. The system ofclaim 12, wherein the femtosecond laser is scanned on each side of theflexure arms over a plurality of passes to gradually and evenly thin thebifilar flexure regions.
 15. The system of claim 12, wherein thefemtosecond laser feathers areas where the flexure arms connect to theflapper to form a gradual transition from a thick to a thin interfacebetween the flexure arms and the support ring.
 16. The system of claim12, wherein after ablating the bifilar flexure, the laser ablates proofmass areas excluding the flexure arm areas and a predetermined area ontop of the proof mass to enable the proof mass to be clamped between twopole pieces, wherein the pole pieces and the proof mass only contacts ata predetermined area opposite the contact arms.
 17. The system of claim12, wherein the flapper comprises a circular configuration except forparts adjacent the bifilar flexure and is spaced from the circularsupport ring by an annular or arcuate gap.
 18. The system of claim 12,wherein the opening or window comprises curvaceous corners.
 19. Thesystem of claim 12, wherein the proof-mass assembly is formed from aquartz wafer.
 20. The system of claim 12, comprising a first arcuateelectrode on an upper surface of the flapper opposite a first pole pieceand a second arcuate electrode on a lower surface of the flapperopposite a second pole piece.